Publication Details:

Established in 2008

Journal or Publication Title:

Armenian Journal of Physics=Ֆիզիկայի հայկական հանդես

Date of publication:

2009

Volume:

2

Number:

1

ISSN:

1829-1171

Official URL:

Coverage:

80-81

Abstract:

The implementation of wave methods to obtain the image of topological layers with regular decrease of the wavelength of the exposing (actinic) radiation turns to be the basis of micro(nano)electronics progress for its almost half a century rapid development. The limitation of resolution of optical photolithography, described by Fresnel relations for contact lithography and Rayleigh-Abby criteria for projection lithography, were resolved consequently by the transfer to projection optics with the application of DUV.

Date created:

2009-04-09

Format:

pdf

Identifier:

oai:arar.sci.am:23226

Location of original object:

ՀՀ ԳԱԱ Հիմնարար գիտական գրադարան