Հրապարակման մանրամասներ:

Established in 2008

Ամսագրի կամ հրապարակման վերնագիր:

Armenian Journal of Physics=Ֆիզիկայի հայկական հանդես

Հրապարակման ամսաթիւ:

2020

Հատոր:

13

Համար:

2

ISSN:

1829-1171

Պաշտոնական URL:

Ծածկոյթ:

140-148

Ամփոփում:

Today, magnetron sputtering installations use electrical power in kW or even hundreds of kW. Uniform deposition, as a rule, is achieved by significant removal of the substrate from the sprayed cathode. But as the distance between the sputtered cathode and the substrate increases, the degree of clusterization of the particles increases, i.e. on the surface of the substrate clusters are formed, rather than individual atoms of the sprayed material. This is not always desirable. In addition, difficulties arise in the deposition of multicomponent films. One of the ways to solve this problem is to use partitioned cathodes, when the inserts are made from other sprayed materials into the main cathode material. However, the heterogeneity of the cathode leads to instabilities in the burning of the discharge and to associated defects in the deposited layers. It is more reasonable to use a mosaic of mini-magnetrons, each of which has its own independent power supply, instead of a large-sized magnetron cathode. The article shows the possibility of improving the uniformity of the deposition, including multicomponent films using a system of minimagnetrons. A diagram of the magnetron power source is given.

Ձեւաչափ:

pdf

Նոյնացուցիչ:

oai:arar.sci.am:263313

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