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Armenian Journal of Physics=Ֆիզիկայի հայկական հանդես
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CHARACTERIZATION OF ANNEALED NI/CU MULTILAYERS ON SI(100)
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In this work results of magnetic and structural measurements of annealed Cu/Ni multilayers, with different thicknesses of Ni and Cu prepared on (100) polycrystalline Si substrates, have been presented. Samples were obtained by the RF (DC) magnetron sputtering method and after deposition they were heated from 150°C to 350°C. The nanostructure of annealed Cu-Ni multilayers were analyzed using X-ray diffraction (XRD) and high-temperature XRD (HT-XRD). The annealing times of the multilayers varied from 0 to 180 minutes in vacuum chamber. The existence of satellite peaks in the XRD patterns showed that the multilayer films have superlattice structures.